Concentric flow reactor
US10920340B2 · kind B2 · utility
1Cited by
6References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2019 |
| Grant date | Feb 16, 2021 |
| Priority date | — |
| Expiry date | Jan 17, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/102
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.