Method for characterisation by CD-SEM scanning electronic microscopy
US10921269B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2017 |
| Grant date | Feb 16, 2021 |
| Priority date | — |
| Expiry date | Dec 12, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, includes producing an experimental image; from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model U(Pi,ti) describing the signal measured at the position Pi at the instant ti, the second model U(Pi,ti) being obtained by algebraic summation of a corrective term S(Pi,ti); determining the set of parameters present in the second theoretical model; wherein the corrective term S(Pi,ti) is calculated by summing the signal coming from the electric charges deposited by the primary electron beam at a plurality of instants t less than or equal to ti.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.