Method for producing transparent optical film and method for producing transparent multilayer film
US10927446B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2019 |
| Grant date | Feb 23, 2021 |
| Priority date | — |
| Expiry date | Sep 12, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/115
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This method for producing a transparent optical film includes a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer formed of a high standard electrode potential metal having a higher standard electrode potential than that of silver by vacuum deposition, and an alloying step of forming a silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.