Drying system and drying method for cleaning solution on mask
US10928130B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 5, 2018 |
| Grant date | Feb 23, 2021 |
| Priority date | — |
| Expiry date | Sep 15, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B5/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A drying system and a drying method for a cleaning solution on a mask are disclosed. The drying system includes: a drying chamber having a first side wall and a second side wall arranged opposite to the first side wall; a plurality of first air knives on the first side wall and the second side wall for air-drying a cleaned mask; and a separation device for allowing a mask strip and a supporting and shielding strip to move away from each other at a spatial intersection region to increase a spacing between the mask strip and the supporting and shielding strip at the spatial intersection region, when the plurality of first air knives are air-drying the cleaned mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.