Photoactivable nitrogen bases

US10928728B2 · kind B2 · utility

Assignee

• BASF SE

Inventors

• Kurt Dietliker · Allschwil, CH
• Katharina Misteli · Basel, CH
• Katia Studer · Rixheim, FR
• Tunja Jung · Rheinfelden (Baden), DE
• Lother Alexander Engelbrecht · Heerenveen, NL

Key dates

• Filing date: Jan 26, 2018
• Grant date: Feb 23, 2021
• Expiry date: Aug 9, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Compounds of the Formula (I), (II) and (III) wherein Ar is for example phenylene, biphenyleneor naphthylene, all of which are unsubstituted or substituted by C1-C4-alkyl, C2-C4-alkenyl, CN, OR11, SR11, CH 2OR11, COOR12, CONR12R13 or halogen; R1, R2, R7 and R8 independently of one another other are hydrogen or C1-C6-alkyl; R3 and R5 together and R4 and R6 together form a C2-C6-alkylene bridge which is unsubstituted or substituted by one ore more C1-C4-alkyl; R11 is hydrogen or C1-C6-alkyl; R12 and R13 independently of one another for example are hydrogen, phenyl, C1-C18-alkyl, C1-C18-alkyl which is interrupted by one or more O; n is 1-10; X is O, S or NR10; A and A1 are suitable linking groups; are suitable as photolatent bases.