Vapor phase transport system and method for depositing perovskite semiconductors
US10930494B2 · kind B2 · utility
3Cited by
4References
24Claims
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Key dates
| Filing date | Apr 7, 2020 |
| Grant date | Feb 23, 2021 |
| Priority date | — |
| Expiry date | Apr 7, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/549
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Vapor phase transport systems and methods of depositing perovskite films are described. In an embodiment, a deposition method includes feeding a perovskite solution or constituent powder to a vaporizer, followed by vaporization and depositing the constituent vapor as a perovskite film. In an embodiment, a deposition system and method includes vaporizing different perovskite precursors in different vaporization zones at different temperatures, followed by mixing the vaporized precursors to form a constituent vapor, and depositing the constituent vapor as a perovskite film.
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