Electrode array for a dielectrically impeded plasma treatment
US10932351B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2016 |
| Grant date | Feb 23, 2021 |
| Priority date | — |
| Expiry date | Dec 26, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/34
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The invention relates to an electrode array for a dielectrically impeded plasma treatment of a surface of an electrically conductive body used as a counter electrode, comprising a flexible planar electrode (1) and a dielectric (2) of a planar flexible material, which by way of a layer (3) preventing a direct current flow shields the electrode (1) from the surface to be treated. By way of a structure having projections, the dielectric (2) can rest upon the surface to be treated, wherein air spaces for forming the plasma are formed in between the projections. The producibility in particular is improved in that the structure is a lattice structure (6) of adjoining walls (7, 8) that limit a plurality of chambers (9) forming the air spaces, and in that the chambers (9) have a bottom-side closure through the layer (3) of the dielectric (2) preventing the direct current flow and have a face that is open to the surface to be treated, the contact surface of which face consists of end edges (10) of the walls (7, 8) of the lattice structure (6) on the surface to be treated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.