Self-aligned hard masks with converted liners

US10937689B2 · kind B2 · utility

Assignee

• Intel Corporation · US

Inventors

• Manish Chandhok · Beaverton, US
• Satyarth Suri · Hillsboro, US
• Tristan A. Tronic · Beaverton, US
• Christopher J. Jezewski · Portland, US
• Richard E. Schenker · Portland, US

Key dates

• Filing date: Dec 30, 2016
• Grant date: Mar 2, 2021
• Expiry date: Dec 30, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02252
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

In one embodiment, a trench may be formed in a dielectric surface, and the trenched may be lined with a liner. The trench may be filled with a metal, and the metal may be recessed below an opening of the trench. The liner may be converted into a dielectric, and a hard mask may be deposited into the trench.