Patent · US Active

Method for preparing an organic semiconductor layer and an organic electronic device

US10937966B2 · kind B2 · utility

0Cited by

4References

15Claims

0Family size

Assignee

Novaled GmbH · DE

Inventors

Steffen Runge · Dresden, DE
Carsten Rothe · Dresden, DE
Julien Frey · Dresden, DE
Uwe Gölfert · Rabenau, DE

Key dates

Filing date	Aug 30, 2017
Grant date	Mar 2, 2021
Priority date	—
Expiry date	Oct 19, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH10K85/342
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The present invention relates to a method for preparing an organic semiconductor layer in a vacuum chamber at a pressure of 10−5 to 10−9 mbar comprising a step of sublimating a composition from a single vacuum thermal evaporation source arranged in the vacuum chamber, wherein the composition comprises a physical mixture of (a) a first organic aromatic matrix compound having a molecular weight ≥400 and ≤1,000: and (b) a first alkali organic complex having a molecular weight of ≥100 and ≤400.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.