Method of manufacturing graphene using photoreduction
US10941041B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Jul 6, 2018 |
| Grant date | Mar 9, 2021 |
| Priority date | — |
| Expiry date | Aug 15, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/1203
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present disclosure is directed to a low temperature method of preparing graphene. The method comprises applying a graphene oxide to a substrate and treating the graphene oxide on the substrate using photoreduction to reduce and stitch the graphene oxide to graphene. The present disclosure is also directed to graphene produced according to the aforementioned method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.