Digital elevation model quality control
US10943392B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 13, 2019 |
| Grant date | Mar 9, 2021 |
| Priority date | — |
| Expiry date | Nov 13, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V20/13
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method can include receiving, first and second digital elevation models (DEMs) including first elevation data of a geographic location and second elevation data of the geographic location, respectively, identifying differences between the first elevation data and the second elevation data that are greater than a first threshold, determining, for a point in the second elevation data identified to correspond to a difference greater than the first threshold, a slope of the geographic location around and including the point, and altering, in response to determining the difference is greater than a second threshold determined based on the determined slope, elevation data of the second DEM corresponding to the point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.