Formation of diamond membranes

US10946344B2 · kind B2 · utility

Assignees

• IMEC VZW · BE
• Universiteit Hasselt · BE

Inventors

• Rajesh Ramaneti · Hasselt, BE
• Giedrius Degutis · Hasselt, BE
• Ken Haenen · Hasselt, BE
• Marlies Van Bael · Molenbeek-Wersbeek, BE
• Paulius Pobedinskas · Boncelles, BE

Key dates

• Filing date: Apr 16, 2019
• Grant date: Mar 16, 2021
• Expiry date: Apr 16, 2039

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01D2325/26
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

In a first aspect, the present disclosure relates to a method for forming a diamond membrane, comprising: providing a substrate having an amorphous dielectric layer thereon, the amorphous dielectric layer comprising an exposed surface, the exposed surface having an isoelectric point of less than 7, preferably at most 6; seeding diamond nanoparticles onto the exposed surface; growing a diamond layer from the seeded diamond nanoparticles; and removing a portion of the substrate from underneath the diamond layer, the removed portion extending at least up to the amorphous dielectric layer, thereby forming the diamond membrane over the removed portion.