Composition, imprinting ink and imprinting method
US10946625B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2013 |
| Grant date | Mar 16, 2021 |
| Priority date | — |
| Expiry date | Apr 29, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0757
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is a silane-based composition for forming an imprinting ink for imprint lithography applications in which the crosslinking of the silanes in the composition is suppressed by the inclusion of a compound of Formula 3: wherein R9 is selected from the group consisting of C1-C6 linear or branched alkyl groups and a phenyl group, and wherein n is a positive integer having a value of at least 2. An ink may be formed by adding a PAG, photoinitiator or TAG to the composition such upon their activation, the crosslinking reaction is completed. An imprinting method using 10 such an ink is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.