Patent · US Active

Processing arrangement and method for conditioning a processing arrangement

US10947619B2 · kind B2 · utility

0Cited by
2References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 5, 2018
Grant dateMar 16, 2021
Priority date
Expiry dateNov 4, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/45591
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A processing arrangement comprising: a process chamber comprising an upper chamber wall, a lower chamber wall and two lateral chamber walls; an insulating structure, arranged between the processing region and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for thermally insulating the processing region, wherein the insulating structure is configured as gas-permeable at least in sections in such a way that a process gas from the processing region can flow out of the processing region in the direction in each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, through the insulating structure; and a gas channel, arranged between the insulating structure and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for pumping away the process gas which flows through the insulating structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.