Mask plate and manufacture method thereof
US10947620B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 20, 2018 |
| Grant date | Mar 16, 2021 |
| Priority date | — |
| Expiry date | Nov 20, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05C21/005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure provides a mask plate and a manufacture method thereof, the mask plate including: a mask body, which is provided with an opening penetrating through a thickness of the mask body; a special-shaped portion configured to be disposed at an edge of the opening and protrudes toward a center of the opening, and configured to be formed by the mask body; and at least one deformation adjustment layer disposed on the mask body or in the mask body, an orthographic projection of the at least one deformation adjustment layer on a plane in which a first surface of the mask body is located at least partially overlaps with an orthographic projection of the special-shaped portion on the plane in which the first surface of the mask body is located, wherein a thermal expansion coefficient of the deformation adjustment layer is different from that of the special-shaped portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.