Method for preparing invisible anodic aluminum oxide pattern
US10947634B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Oct 24, 2018 |
| Grant date | Mar 16, 2021 |
| Priority date | — |
| Expiry date | Jan 25, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D11/24
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for preparing invisible anodic aluminum oxide (AAO) patterns is revealed. The method includes a plurality of steps. First take an aluminum substrate. Then anodize the aluminum substrate for the first time to get a first anodic aluminum oxide (AAO). Next perform photolithography so that a photoresist forms a pattern on the aluminum substrate with the first AAO. Lastly anodize the aluminum substrate for the second time so that a second AAO is formed on the pattern and the pattern becomes invisible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.