Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom

US10954334B2 · kind B2 · utility

Assignee

• Align Technology, Inc. · US

Inventors

• Robert Liska · Schleinbach, AT
• Christian Gorsche · Wien, AT
• György Harakaly · Wien, AT
• Markus Kury · Wien, AT
• Jürgen Stampfl · Wien, AT
• Peter Dorfinger · Los Altos Hills, US
• Yan Chen · Cupertino, US
• Chunhua Li · Cupertino, US
• Srinivas Kaza · Burr Ridge, US

Key dates

• Filing date: Oct 15, 2019
• Grant date: Mar 23, 2021
• Expiry date: Oct 15, 2039

Classification

• Technology area (CPC —): General

Abstract

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.