Consistent mask targeting through standardized drop-in-cells
US10955739B2 · kind B2 · utility
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4References
25Claims
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Key dates
| Filing date | Nov 28, 2017 |
| Grant date | Mar 23, 2021 |
| Priority date | — |
| Expiry date | Nov 28, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask process development having a consistent mask targeting is described. A method includes receiving an integrated circuit (IC) design. A test mask is generated that converts the IC design into one or more physical layouts. A set of one or more sub-resolution assist features (SRAFs) is inserted into the test mask. The set of one or more SRAFs is inserted into one or more other masks, which are derived from the test mask for mask targeting, such that the test mask and the one or more other masks include a same set of the one or more SRAFs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.