Transistor device with a field electrode that includes two layers
US10957771B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 12, 2020 |
| Grant date | Mar 23, 2021 |
| Priority date | — |
| Expiry date | May 12, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/605
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed is a transistor device which includes a semiconductor body having a first surface, a source region, a drift region, a body region being arranged between the source region and the drift region, a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric, and a field electrode adjacent the drift region and dielectrically insulated from the drift region by a field electrode dielectric. The field electrode includes a first layer and a second layer. The second layer includes a different conductive material as the first layer. A portion of the second layer is disposed above and directly contacts a portion of the first layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.