Method and system for providing ultrapure water with flexible lamp configuration
US10961143B2 · kind B2 · utility
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3References
22Claims
0Family size
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Key dates
| Filing date | May 4, 2016 |
| Grant date | Mar 30, 2021 |
| Priority date | — |
| Expiry date | Aug 26, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/1846
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.