Fine mask support frame, fine mask, and method for fabricating the same
US10961616B2 · kind B2 · utility
1Cited by
0References
7Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 5, 2018 |
| Grant date | Mar 30, 2021 |
| Priority date | — |
| Expiry date | Jul 5, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This disclosure relates to the field of display fabrication technologies, and discloses a fine mask support frame, a fine mask, and a method for fabricating the same. The fine mask support frame includes: a plurality of bezels surrounding a mask area, wherein adjustment openings are arranged on at least one pair of bezels arranged opposite to each other, and at least one adjustment piece is arranged on each of the adjustment openings, wherein the adjustment piece is configured to adjust a shape of a corresponding adjustment opening to thereby adjust deformation of the mask area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.