Measuring crop residue from imagery using a machine-learned classification model
US10963751B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 7, 2018 |
| Grant date | Mar 30, 2021 |
| Priority date | — |
| Expiry date | Oct 12, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V20/68
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present disclosure provides systems and methods that measure crop residue in a field from imagery of the field. In particular, the present subject matter is directed to systems and methods that include or otherwise leverage a machine-learned crop residue classification model to determine a crop residue parameter value for a portion of a field based at least in part on imagery of such portion of the field captured by an imaging device. For example, the imaging device can be a camera positioned in a downward-facing direction and physically coupled to a work vehicle or an implement towed by the work vehicle through the field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.