Metamaterial optical filter and method for producing the same
US10969528B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2017 |
| Grant date | Apr 6, 2021 |
| Priority date | — |
| Expiry date | Jul 13, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2223/15
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metamaterial optical filter including: a transparent substrate; and a photosensitive polymer layer provided to the transparent substrate, wherein the photosensitive polymer layer is treated using a laser to form a non-conformal holographically patterned subwavelength grating, the holographic grating configured to block a predetermined wavelength of electromagnetic radiation. A system and method for manufacturing holographically patterned subwavelength grating onto the photosensitive polymer layer including: applying a photosensitive polymer layer to a transparent substrate; placing the photosensitive polymer layer between a laser and a mirror; scanning the laser over the photosensitive polymer layer such that a holographic grating is created within the photosensitive polymer layer by interaction between the laser light and light reflected from the mirror; and stacking two or more holographically patterned subwavelength grating layers to form complex metamaterial optical filter stacks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.