Optoelectronic device and method of manufacturing thereof
US10969547B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 7, 2018 |
| Grant date | Apr 6, 2021 |
| Priority date | — |
| Expiry date | Jun 7, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/063
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optoelectronic device and method of manufacturing the same. The device includes: a layer disposed above a substrate, the layer having a first cavity therein, which cavity is at least partially defined by an inclined interface between the cavity and an insulating liner, the interface being disposed at an angle relative to the substrate of greater than 0° and less than or equal to 90°; and a regrown semiconductor material, providing or forming a part of a waveguide, the regrown semiconductor material being at least partly disposed in the first cavity and including an inclined interface between the regrown semiconductor material and the insulating liner, the interface being disposed at an angle relative to the substrate of greater than 0° and less than or equal to 90°.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.