Patent · US Active

Photomask and exposure method

US10969676B2 · kind B2 · utility

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0References

9Claims

0Family size

Assignees

Inventors

Chengyong HE · Beijing, CN
Yang Wang · Suzhou, CN
Jun Yang · Jingwei, CN
Xin Wang · Beijing, CN
Guanzheng LI · Beijing, CN
Jinxiang LI · Beijing, CN
Xingming Wang · Marion, US
Peng Cai · Beijing, CN
Xiaochen Cui · Qingdao, CN
Junwei Zhang · Austin, US
Can Zhang · Beijing, CN
Chunjie Wang · Beijing, CN

Key dates

Filing date	Aug 21, 2018
Grant date	Apr 6, 2021
Priority date	—
Expiry date	Apr 16, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH10D86/0231
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A photomask and an exposure method are provided. The photomask includes a photomask body including a first surface and a second surface opposite to each other; and a first light-transmissive region penetrating through the first surface and the second surface, wherein a light adjustment component is in the first light-transmissive region and configured to converge a first light beam incident onto the first surface to a second light beam emergent from the second surface, and a cross-sectional area of the first light beam sectioned by the first surface is larger than that of the second light beam sectioned by the second surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.