System and method for producing an optical mask for surface microtexturing, and surface microtexturing plant and method
US10969679B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 21, 2017 |
| Grant date | Apr 6, 2021 |
| Priority date | — |
| Expiry date | May 4, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/76
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the surface (11) of the substrate (10) and has an outer surface (21) that is exposed to the outside environment; and a generating and depositing device for generating and depositing droplets (30) on the outer surface (21) of the layer of material (20), in a specific arrangement (31) under condensation, forming the optical mask (35) on the outer surface (21) of the layer of material (20). The invention also relates to a treatment plant comprising a system (2) of said type. The invention further relates to a method for producing a mask as well as to a surface microtexturing method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.