Producing light-exposed structures on a workpiece

US10969693B2 · kind B2 · utility

Assignee

• temicon GmbH · DE

Inventors

• Oliver Humbach · Dortmund, DE
• Thomas Ruhl · Bischofswerda, DE

Key dates

• Filing date: Jul 4, 2018
• Grant date: Apr 6, 2021
• Expiry date: Jul 4, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B5/18
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A device and method for producing light-exposed structures on a workpiece having a light-sensitive surface. An optical unit includes a light source and a diffraction grating for producing a strip-shaped illumination pattern having strips extending in a longitudinal direction and having a pattern width extending transversely. A device moves the surface of the workpiece and optical unit relative to each other according to a path sequence, which includes movement longitudinal paths to produce a first and second light-exposed structure having strips, which is oriented parallel to each other on the workpiece surface. The movement paths are mutually spaced apart by less than the pattern width and the light-exposed structures overlap in such a way that strips of the light-exposed structures lie on each other. To obtain good light exposure of the surface by the illumination pattern, the diffraction grating is set oblique to the surface of the workpiece that is light-exposed by the illumination pattern.