Systems and methods for particle pattern simulation
US10970433B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Mar 25, 2019 |
| Grant date | Apr 6, 2021 |
| Priority date | — |
| Expiry date | Aug 16, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/10
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method is provided comprising, receiving, by a computer system comprising a processor and a tangible, non-transitory memory, particle parameters, creating, by the computer system, particle elements in accordance with the particle parameters, and building, by the computer system, a pattern using the particle elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.