Plasma processing apparatus and plasma processing method
US10971332B2 · kind B2 · utility
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1References
10Claims
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Assignee
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Key dates
| Filing date | May 11, 2020 |
| Grant date | Apr 6, 2021 |
| Priority date | — |
| Expiry date | May 11, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus includes a processing chamber configured to process a substrate, a plasma generator configured to generate a plasma, a transport unit configured to transport, to the processing chamber, the plasma generated by the plasma generator, and a scanning magnetic field generator configured to generate a magnetic field which deflects the plasma so as to scan the substrate by the plasma. The scanning magnetic field generator is configured to be capable of adjusting a center of a locus of the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.