Systems and methods for heating reductant
US10975749B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2018 |
| Grant date | Apr 13, 2021 |
| Priority date | — |
| Expiry date | Mar 14, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/40
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
An aftertreatment system includes a reductant source, a junction, a dosing pump module, a valve assembly, and a dosing module. The reductant source stores reductant. The junction receives the reductant from the reductant source. The dosing pump module receives the reductant from the junction and selectively provides the reductant to a first conduit. The valve assembly receives the reductant from the first conduit. The valve assembly is operable between a first state, where the valve assembly provides the reductant to the junction, and a second state, where the valve assembly provides the reductant to a second conduit. The dosing module receives the reductant from the second conduit when provided by the valve assembly. The dosing module is configured to dose exhaust gases with the reductant when provided by the valve assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.