Meta-optical device and method of manufacturing the same
US10976472B2 · kind B2 · utility
3Cited by
4References
17Claims
0Family size
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Key dates
| Filing date | Nov 7, 2017 |
| Grant date | Apr 13, 2021 |
| Priority date | — |
| Expiry date | Apr 17, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24364
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A meta-optical device and a method of manufacturing the same are provided. The method includes depositing a group III-V compound semiconductor on a substrate, forming an anti-oxidation layer, performing crystallization by using post annealing, removing the anti-oxidation layer, and manufacturing a meta-optical device by using patterning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.