Patent · US Active

Manufacturing method for liquid crystal display panel with high transmittance and display panel thereof

US10976586B2 · kind B2 · utility

1Cited by
0References
15Claims
0Family size

Inventors

Key dates

Filing dateMar 14, 2019
Grant dateApr 13, 2021
Priority date
Expiry dateSep 6, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/02274
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A manufacturing method for a liquid crystal display panel is disclosed and includes a step forming a refractive index gradient layer, a step forming a gate electrode insulation layer, a step forming a first interlayer dielectric layer, and a step forming a second interlayer dielectric layer. The step forming a refractive index gradient layer includes depositing a silicon nitride layer on a glass substrate, depositing the refractive index gradient layer on the silicon nitride layer. The refractive index gradient layer is silicon oxide, and includes a lower refractive index decremental layer and a lower refractive index constant layer. A refractive index of the decremental layer gradually decreases along a direction away from the silicon nitride layer, the lower refractive index constant layer is on the lower refractive index decremental layer. A reflection rate between light in film layers can be lowered to improve light transmittance of the display panel.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.