Photosensitive composition, colored pattern and method for producing same
US10976663B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2017 |
| Grant date | Apr 13, 2021 |
| Priority date | — |
| Expiry date | Feb 25, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/388
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition contains a polysiloxane compound, a photoacid generator, a coloring agent and a solvent. A content of the coloring agent with respect to a total solid content of the composition is 5% by weight or more. The polysiloxane compound contains a cyclic polysiloxane structure and a cationically polymerizable functional group. The polysiloxane compound may further have an alkali-soluble functional group. A content of the polysiloxane compound with respect to the total solid content of the composition is preferably 20-80% by weight. The photosensitive composition is used, for example, in formation of a colored pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.