Systems and methods for ICPMS matrix offset calibration
US10978280B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2018 |
| Grant date | Apr 13, 2021 |
| Priority date | — |
| Expiry date | Jun 25, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/26
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods are described for calibrating an analytical instrument analyzing a plurality of sample matrices in series. A system embodiment can include, but is not limited to, a sample analysis device configured to receive a plurality of samples from a plurality of remote sampling systems and to determine an intensity of one or more species of interest contained in each of the plurality of samples; and a controller configured to generate a primary calibration curve based on analysis of a first standard solution having a first sample matrix by the sample analysis device and generate at least one secondary calibration curve based on analysis of a second standard solution having a second sample matrix by the sample analysis device, the controller configured to associate the at least one secondary calibration curve with the primary calibration curve according to a matrix correction factor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.