Self-assembly composition for pattern formation and pattern forming method
US10982032B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 29, 2016 |
| Grant date | Apr 20, 2021 |
| Priority date | — |
| Expiry date | Jun 30, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/54
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
An object of the present invention is to provide a self-assembly composition for pattern formation, which is capable of forming a favorable phase-separated structure even in the case of forming a large size pattern. In addition, another object of the present invention is to provide a self-assembly composition for pattern formation, which is capable of forming a pattern by a simple process, with no need for preparation of a under layer, etc., upon formation of a fine pattern structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) comprising two or more units consisting of at least one type selected from a glucose unit and a xylose unit, and a polymerization unit (b) comprising two or more units consisting of at least one type selected from an aromatic ring-containing unit, a silicon-containing unit and a metal-containing unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.