Multi-patch multi-view system for stitching along a predetermined path
US10982365B2 · kind B2 · utility
2Cited by
6References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 8, 2018 |
| Grant date | Apr 20, 2021 |
| Priority date | — |
| Expiry date | Jun 22, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/45196
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate multi-patch multi-view systems that may reduce errors associated with material thickness, object height, perspective. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.