Shutter device, method of controlling same, photolithography machine, and method of controlling exposure dose thereof
US10983415B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2018 |
| Grant date | Apr 20, 2021 |
| Priority date | — |
| Expiry date | Jan 25, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02K33/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A shutter device includes a light blocking unit and a voice coil motor. The voice coil motor includes a permanent magnet module, a guide track assembly and a coil assembly. The coil assembly is arranged on the guide track assembly, and the permanent magnet module is adapted to produce a magnetic field in the guide track assembly. The light blocking unit includes two shutter blades both connecting to the coil assembly. When energized, the coil assembly will produce a magnetic field having a direction same as or opposite to the direction of the magnetic field in the guide track assembly so that the coil assembly moves forward or backward along the guide track assembly to drive the two shutter blades to open or close. A method controls the shutter device. An exposure dose control method is used with a photolithography machine including the shutter device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.