Darkfield modeling
US10984209B2 · kind B2 · utility
1Cited by
73References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2019 |
| Grant date | Apr 20, 2021 |
| Priority date | — |
| Expiry date | Mar 5, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8822
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In a method for modeling a darkfield candidate image at a sensor, a plurality of darkfield images of the sensor is captured, wherein each darkfield image of the plurality of darkfield images is associated with a different operational condition of the sensor. An operational condition of the sensor is determined. A darkfield candidate image comprising a combination of the plurality of darkfield images is modeled based at least in part on the operational condition of the sensor, wherein a contribution of each darkfield image of the plurality of darkfield images is dependent on the operational condition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.