Chelating etching agent stimulation and proppant stabilization of low-permeability subterranean formations
US10988674B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 1, 2015 |
| Grant date | Apr 27, 2021 |
| Priority date | — |
| Expiry date | May 1, 2035 |
Classification
- Technology area (CPC E)Fixed Constructions
- CPC primaryE21B43/267
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Methods including introducing a first treatment fluid comprising a first aqueous base fluid and a chelating etching agent into a low-permeability subterranean formation comprising carbonate material having a first fracture network at a first treatment interval therein, wherein the first fracture network comprises a first main fracture and a first microfracture. The method further comprises placing the chelating etching agent in the first fracture network and reacting it with the carbonate material in the first fracture network. In certain embodiments, the reacting removes the carbonate material, thereby creating at least one conductive channel on a face of the first fracture network. The method further comprises introducing a second treatment fluid comprising a second aqueous base fluid and micro-sized proppant particulates into the low-permeability subterranean formation and placing the micro-sized proppant particulates into the first fracture network to form a partial monolayer in the first microfracture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.