Patent · US Active

Silsesquioxane resin and oxaamine composition

US10990012B2 · kind B2 · utility

1Cited by
23References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 27, 2017
Grant dateApr 27, 2021
Priority date
Expiry dateNov 5, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G77/70
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A silsesquioxane-containing composition comprising a silsesquioxane resin and an oxaamine of formula (II) (see description), products prepared therefrom, photoresist compositions comprising the silsesquioxane-containing composition and a photoacid generator, products prepared therefrom, methods of making and using same, and manufactured articles and semiconductor devices containing same.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.