Patent · US Active

Method for producing an optoelectronic semiconductor component and optoelectronic semiconductor component

US10991845B2 · kind B2 · utility

1Cited by
3References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 29, 2018
Grant dateApr 27, 2021
Priority date
Expiry dateMar 29, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/8506
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method for producing an optoelectronic semiconductor component and an optoelectronic semiconductor component are disclosed. In an embodiment the method include A) providing at least two source substrates, wherein each of the source substrates is equipped with a specific type of radiation-emitting semiconductor chip; B) providing a target substrate having a mounting plane, the mounting plane being configured for mounting the semiconductor chip; and C) transferring at least part of the semiconductor chips with a wafer-to-wafer process from the source substrates onto the target substrate so that the semiconductor chips, within one type, maintain their relative position with respect to one another, so that each type of semiconductor chips arranged on the target substrate has a different height above the mounting plane, wherein the semiconductor chips are at least one of at least partially stacked one above the other or at least partially applied to at least one casting layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.