Deposition of molybdenum thin films using a molybdenum carbonyl precursor
US10995405B2 · kind B2 · utility
10Cited by
4References
18Claims
0Family size
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Key dates
| Filing date | Feb 17, 2017 |
| Grant date | May 4, 2021 |
| Priority date | — |
| Expiry date | Apr 17, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Transition metal precursors are disclosed herein along with methods of using these precursors to deposit metal thin films. Advantageous properties of these precursors and methods are also disclosed, as well as superior films that can be achieved with the precursors and methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.