Manufacturing method of phase difference element, phase difference element, and projection image display device
US10996388B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2019 |
| Grant date | May 4, 2021 |
| Priority date | — |
| Expiry date | Dec 5, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B21/005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
To provide a manufacturing method of a phase difference element which is superior in moisture resistance. After forming an optically anisotropic layer by way of oblique vapor deposition on a substrate, the optically anisotropic layer is covered by a protective layer made by depositing an inorganic compound by way of an atomic layer deposition method. More specifically, established is a manufacturing method of a phase difference element containing a transparent substrate, optically anisotropic layer containing a birefringent film and a protective layer, the method including: an optically anisotropic layer formation step of forming an optically anisotropic layer by forming a birefringent film by way of oblique vapor deposition; and a protective layer formation step of forming a protective layer by depositing an inorganic compound by way of an atomic layer deposition method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.