Method and system for adjusting the profile of a laser wavefront
US10998691B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 17, 2019 |
| Grant date | May 4, 2021 |
| Priority date | — |
| Expiry date | Jan 4, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2383
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system for adjusting the profile of a laser wavefront formed by at least a laser beam to a desired laser wavefront profile, the laser beam or beams presenting random phases and intensities, comprises a mixing module, configured to generate, from interference phenomena among the laser beam or beams, a laser field, a second intensity measuring module configured to measure the mixed intensities of the laser field portions, a calculation unit configured to calculate one or several phase correction values of the phase of the laser beam or the phases of laser beams, from the intensities of the laser beams, the mixed intensities and one or several predetermined target phases, and a phase adjustment module configured to apply the phase correction value or values obtained from the calculation unit to the laser beam phases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.