Patent · US Active

Treatment of implants with phosphonic acid compounds

US11000627B2 · kind B2 · utility

0Cited by
2References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 13, 2017
Grant dateMay 11, 2021
Priority date
Expiry dateFeb 13, 2037

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61L2420/02
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

The present invention relates to a process of treating an implant, comprising a step of treating the surface of the implant with at least one phosphonic acid compound or a pharmaceutically acceptable salt, ester or amide thereof under sonication at a temperature of about 50° C. to about 90° C. This process is highly advantageous in that it allows the formation of a monolayer of the phosphonic acid compound on the implant surface, having a particularly dense surface coverage which, in turn, results in an improved implant biocompatibility and improved osseointegration. The invention further relates to a surface-treated implant obtainable by this process and, in particular, it provides an implant having a surface made of a metal, a metal alloy or a ceramic, wherein a phosphonic acid compound or a pharmaceutically acceptable salt, ester or amide thereof is bound to the surface of the implant and forms a monolayer having an implant surface coverage, in terms of the ratio of the phosphorus content to the metal content as determined by X-ray photoelectron spectroscopy (XPS), of at least 70% of a reference maximum surface coverage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.