Patent · US Active

Method and apparatus for single particle deposition

US11001087B2 · kind B2 · utility

4Cited by
6References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 21, 2017
Grant dateMay 11, 2021
Priority date
Expiry dateMar 21, 2037

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2035/1062
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method of depositing single particles onto a target includes loading a particle suspension to a droplet dispenser having a suspension reservoir and a nozzle section, detecting particles in the nozzle section, testing a single particle condition of the droplet dispenser, and determining whether an ejection region of the nozzle section includes one single particle. The method further includes operating the droplet dispenser for dispensing a droplet such that the droplet is dispensed onto the target if the single particle condition is fulfilled, or the droplet is dispensed into a collection reservoir if the single particle condition is not fulfilled. The step of testing the single particle condition further includes determining whether a sedimentation region adjacent to the ejection region is free of particles. A dispenser for performing the method is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.