Molecular design to suppress desorption of self-assembled monolayers
US11002730B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 2018 |
| Grant date | May 11, 2021 |
| Priority date | — |
| Expiry date | Aug 26, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2650/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The compositions described herein include a substrate, wherein the substrate is a metal, metal oxide, metal nitride or a silicon containing material; a self-assembled monolayer (SAM) bonded to the substrate, wherein the self-assembled monolayer comprises: a surface binding unit bonded to the substrate, wherein the surface binding unit is selected from the group consisting of hydroxamates, phosphonates, catechols, halosilanes, alkoxysilanes, phosphonic acids, alkenes, alkynes, alcohols, 1,2-diols, and thiols; a separator unit bonded to the surface binding unit; a mass altering unit bonded to the separator unit; and a detector unit bonded to the separator unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.