Occlusion-based height estimation
US11002855B2 · kind B2 · utility
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13References
20Claims
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Key dates
| Filing date | Dec 27, 2016 |
| Grant date | May 11, 2021 |
| Priority date | — |
| Expiry date | Jul 18, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2203/04101
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A projection system emits light pulses in a field of view and measures properties of reflections. Properties may include time of flight and return amplitude. Foreground objects and background surfaces are distinguished, distances between foreground objects and background surfaces are determined based on reflections that are occluded by the foreground objects and other properties of the projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.