Photo-alignment apparatus that realizes desirable distribution through single exposure and method of manufacturing an optical element
US11003028B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2020 |
| Grant date | May 11, 2021 |
| Priority date | — |
| Expiry date | Mar 12, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/40
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention discloses a photo-alignment apparatus that realizes a desirable distribution through a single exposure and a method of manufacturing an optical element. The photo-alignment apparatus comprises a light source, a linear polarization film, a pixelated electronic-control phase retarder, and a phase retardation plate; the light source is used to provide light for a exposure; the linear polarization film is configured to convert the light emitted by the light source into a linearly-polarized light having a polarization direction parallel to the direction of the transmission axis of the linear polarization film; the pixelated electronic-control phase retarder is configured to generate phase retardations distributed in a desirable pattern; and the phase retardation plate is used to generate a non-pixelated phase retardation. With this photo-alignment apparatus, a polarization distribution of a desirable pattern can be generated, and a corresponding alignment profile can be formed on a polarization sensitive medium.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.