System and method for layout analysis using point of interest patterns and properties
US11003828B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 3, 2020 |
| Grant date | May 11, 2021 |
| Priority date | — |
| Expiry date | Aug 3, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Systems and methods for layout analysis using unit cell properties. A method includes receiving a layout design and analyzing the layout design to identify unit cells in the layout design. The method includes designating points of interest each corresponding to a respective one of the unit cells and classifying the unit cells into a plurality of classifications using the points of interest and the corresponding properties. The method includes identifying unique patterns of the unit cells, and producing a reduced layout including the unique patterns of unit cells. The method includes performing layout processing on the reduced layout and propagating the process results from each of the unique patterns of unit cells in the reduced layout to other unit cells of the layout design having the same classification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.